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Gallium Oxide (Ga2O3)-Sputtering Target

Gallium Oxide (Ga2O3)-Sputtering Target

CAS: 12024-21-4
Molecular Formula: Ga2O3
Purity: 99.99 %-99.999 %
Products Code: TR310800ST
Specification Model: 3 inch dia x 0.125 inch th.etc
EINECS No.: 234-691-7
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Gallium Oxide (Ga2O3)-Sputtering Target introduce:

Characteristic




Gallium(III) trioxide is an inorganic compound with the formula Ga2O3. It exists as several polymorphs, all of which are white, water-insoluble solids. Although no commercial applications exist, Ga2O3 is an intermediate in the purification of gallium, which is consumed almost exclusively as gallium arsenide.




Chemical formula:Ga2O3

Molar mass:187.444 g/mol

Appearance:white crystalline powder

Density:6.44 g/cm3, alpha

             5.88 g/cm3, beta

Melting point:1,900 °C (3,450 °F; 2,170 K) alpha

                       1725 °C, beta

Solubility in water:insoluble

Solubility:soluble in most acids





Application




Gallium(III) oxide has been studied in the use of lasers, phosphors, and luminescent materials. It has also been used as an insulating barrier in tight junctions.Monoclinic β-Ga2O3 is used in gas sensors and luminescent phosphors and can be applied to dielectric coatings for solar cells. This stable oxide has also shown potential for deep-ultraviolet transparent conductive oxides, and transistor applications.




ε-Ga2O3 thin films deposited on sapphire show potential applications as solar-blind UV photodetector.




Thin Ga2O3 films are of commercial interest as gas sensitive materials and Ga2O3. Ellipsometry is a procedure that can be used to determine optical functions of the β-Ga2O3.




β-Ga2O3 is used in the production of Ga2O3-Al2O3 catalyst.
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