3D Printing Metal Powder

Compound Chemicals

Tantalum Tungsten (TaW (97.5:2.5 wt%))-Sputtering Target

Tantalum Tungsten (TaW (97.5:2.5 wt%))-Sputtering Target

Molecular Formula: TaW (97.5:2.5 wt%)
Purity: 99.9%-99.995 %
Products Code: TR737401ST
Specification Model: 8 inch dia x 0.25 inch th.etc
Send Inquiry
Tantalum Tungsten (TaW (97.5:2.5 wt%))-Sputtering Target introduce:


Tantalum alloy is composed of tantalum and other elements.Tantalum's anodic oxidation film is very stable, corrosion resistance, excellent dielectric properties, suitable for the manufacture of electrolytic capacitors.Tantalum has strong resistance to chemical corrosion, except hydrogen fluoride, sulfur trioxide, hydrofluoric acid, hot concentrated sulfuric acid and alkali, at 200℃, the stability of ta-w alloy in acid and neutral medium is even higher than that of gold and foil.


The carbide of tantalum is an important additive in the manufacture of cemented carbide.Tantalum is also used in some electron tubes.In the 1960s, tantalum alloys were used in the aerospace industry as high temperature structural materials.Tantalum and tantalum alloy products are sheet, strip, foil, bar, wire, shaped parts and sintered products.
Hot Tags: Tantalum Tungsten (TaW (97.5:2.5 wt%))-Sputtering Target, manufacturers, suppliers, factory, Customized
  • MSITE CODEhttps://m.kmpass.com/