Titanium Silicide (TiSi2)-Sputtering Target introduce:
Titanium disilicide (TiSi2) is an inorganic chemical compound.
Molar mass：104.038 g/mol
Appearance：black orthorhombic crystals
Melting point：1,470 °C (2,680 °F; 1,740 K)
Solubility in water：insoluble
Solubility： soluble in HF
Titanium silicide is used in the semiconductor industry. It is typically grown by means of salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistors connections. In the microelectronic industry it is typically used in the C54 phase.
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